|
|
|
|
| Home | Contact Us | Services | Materials | Machines | About Us | Search |
|
|
CHEMICALS |
|
RAPID ACCESS CHEMICALS
For rapid access
Reprographic R 30
Universal developer for high temperature in normal and rapid access processors.
Recommended for any line, rapid access and phototype setting material. (correspond to
IIfograhpic LC SP 349).
Reprographic R 92
High contrast developer, in two parts (A and B for the line and contact work
as well as for the phototype setting material treatment. Particularly indicated for
Fuji films and papers.) Also used as a regenerator. (corresponds to STARDOT Fuji).
Reprographic R 94
Two parts (A + B), anti-fog developer designed for phototype setting and Du Pont line materials.
Outstanding results with other films and papers. Excellent resistance to oxidation and clean working.
(corresponds to Du Pont CUFD).
Reprographic R 2000
Developer, formulated particularly for scanner films and also for duplicating contact films, especially
suited if a reduction is required. (corresponds to Kodak 2000).
Compographic A 330
Extremely high contrast developer, formulated to processors and particularly for
Agfa-IIford films and papers. Suitable to obtain high density and sharp images.
(corresponds to Agfa G 101 C).
Rapid fixed
Universal rapid fixed, for tray or machine processing. Dilute with
Farmer A reducer conc.
For local etching. Maximum dilution to use is
Farmer B reducer conc.
For local etching. Maximum dilution to use is
Kranich red lacquer
Alcohol soluble fro film etching.
Red mask in-actinic pens
For film retouching with an anti-evaporation aluminum body.
|
|
|
|
|
|
|
|
Copyright © 2000 G. Syriani & Sons. |